A model of AlN layer formation during ion nitriding of Al
Yükleniyor...
Dosyalar
Tarih
2004-11
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Springer-Verlag
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
A diffusion model of AlN layer formation by ion nitriding of Al is proposed based on the analysis of atomic transport during the process. This model is reduced to the following. Implantation of N ions to the surface of the specimen, named the reaction zone; extraction of Al from the substrate; diffusion transport of Al to the reaction zone through an AlN layer formed during the process; formation and growth of AlN in the reaction zone; sputtering of the AlN layer. Equations controlling the growth process have been obtained.
Açıklama
Anahtar Kelimeler
Plasma-diffusion treatment, Surface modification, Aluminum, Transport, Metals, Atomic physics, Corrosion resistance, Diffusion, Fluxes, Interfaces (materials), Ions, Mathematical models, Surface phenomena, Surfaces, Action zones, Ion nitriding, Surface modifications, Vacancy-fixed ions, Aluminum compounds
Kaynak
Applied Physics A: Materials Science and Processing
WoS Q Değeri
Q2
Scopus Q Değeri
Q2
Cilt
79
Sayı
7
Künye
Dimitrov, V. I. (2004). A model of AlN layer formation during ion nitriding of al. Applied Physics A: Materials Science and Processing, 79(7), 1829-1832. doi:10.1007/s00339-003-2253-y
